Adopts ISO 14237:2000 to specify a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon, using uniformly doped materials calibrated by a certified reference material implanted with boron.
AS ISO 14237-2006
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Surface chemical analysis – Secondary-ion mass spectrometry – Determination of boron atomic concentration in silicon using uniformly doped materials
Standards Australia , 10/20/2006
Pages: 22
